XUAN, Chang, SHI, Weimin, SUN, Lei, WU, Ji, ZHANG, Yongchao und TU, Jiajia, 2026. Improved YOLOv9 with Dual Convolution and LSKA Attention for Robust Small Defect Detection in Textiles. Processes. 1 Januar 2026. Vol. 14, no. 1, p. 149-169. DOI 10.3390/pr14010149.
Elsevier - Harvard (with titles)Xuan, C., Shi, W., Sun, L., Wu, J., Zhang, Y., Tu, J., 2026. Improved YOLOv9 with Dual Convolution and LSKA Attention for Robust Small Defect Detection in Textiles. Processes 14, 149-169. https://doi.org/10.3390/pr14010149
American Psychological Association 7th editionXuan, C., Shi, W., Sun, L., Wu, J., Zhang, Y., & Tu, J. (2026). Improved YOLOv9 with Dual Convolution and LSKA Attention for Robust Small Defect Detection in Textiles. Processes, 14(1), 149-169. https://doi.org/10.3390/pr14010149
Springer - Basic (author-date)Xuan C, Shi W, Sun L, Wu J, Zhang Y, Tu J (2026) Improved YOLOv9 with Dual Convolution and LSKA Attention for Robust Small Defect Detection in Textiles.. Processes 14:149-169. https://doi.org/10.3390/pr14010149
Juristische Zitierweise (Stüber) (Deutsch)Xuan, Chang/ Shi, Weimin/ Sun, Lei/ Wu, Ji/ Zhang, Yongchao/ Tu, Jiajia, Improved YOLOv9 with Dual Convolution and LSKA Attention for Robust Small Defect Detection in Textiles., Processes 2026, 149-169.